LPP EUV LIGHT SOURCE AND METHOD FOR PRODUCING SAME

摘要

An LPP EUV light source includes a vacuum chamber 12 that is maintained in a vacuum environment; a gas jet device 14 that forms a hypersonic steady gas jet 1 of the target substance inside the vacuum chamber so as to be collected; and a laser device 16 that collects and radiates a laser beam 3 to the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting point 2 of the laser beam and EUV light 4 is emitted therefrom.