| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, a pattern formation method, a polymer and a compound which are excellent in pattern formation property, MEEF performance and etching resistance. <P>SOLUTION: A radiation-sensitive resin composition contains a polymer having the formula (1) and an acid generator. <P>COPYRIGHT: (C)2012,JPO&INPIT |
