| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is capable of forming a resist pattern that has low LWR and excellent pattern shape. <P>SOLUTION: The radiation-sensitive resin composition contains (A) a polymer that has a repeating unit having a specific SO<SB>3</SB><SP>-</SP>structure and a repeating unit having a specific acid dissociable group, and (B) a radiation-sensitive acid generator. There is also provided a polymer that has a repeating unit having a specific SO<SB>3</SB><SP>-</SP>structure and a repeating unit having a specific acid dissociable group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
