发明名称 |
PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS |
摘要 |
A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide. |
申请公布号 |
EP2742523(A4) |
申请公布日期 |
2015.01.21 |
申请号 |
EP20120822787 |
申请日期 |
2012.08.01 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
KEHREN, JASON M.;SAVU, PATRICIA M.;PINNOW, MATTHEW J. |
分类号 |
H01L21/027;G03F7/40 |
主分类号 |
H01L21/027 |
代理机构 |
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地址 |
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