发明名称 PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS
摘要 A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.
申请公布号 EP2742523(A4) 申请公布日期 2015.01.21
申请号 EP20120822787 申请日期 2012.08.01
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 KEHREN, JASON M.;SAVU, PATRICIA M.;PINNOW, MATTHEW J.
分类号 H01L21/027;G03F7/40 主分类号 H01L21/027
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