| 主权项 |
1. A manufacturing method of a liquid crystal display (TFT-LCD) array substrate comprises,
Step 1, depositing a gate metal film on a substrate, forming a gate line, a common electrode line, a first gate electrode, a second gate electrode, a third gate electrode and a first connecting electrode, wherein the first gate electrode and the third gate electrode are connecting with the gate line, and the second gate electrode is connected with the first connecting electrode; Step 2, depositing a gate insulating layer, a semiconductor film, a doped semiconductor film and a source/drain metal film on the substrate after step 1, forming a data line, a power supply line, a signal line, a first active layer, a first source electrode, a first drain electrode, a first TFT channel region, a second active layer, a second source electrode, a second drain electrode, a second TFT channel region, a third active layer, a third source electrode, a third drain electrode, a third TFT channel region and a second connecting electrode by a patterning process, wherein the first drain electrode is connected with the second connecting electrode and the second drain electrode is connected with the third drain electrode; Step 3, depositing a passivation layer on the substrate after step 2, and forming a first through hole, a second through hole and a third though hole, wherein the first through hole is located above the first connecting electrode, the second through hole is located above the second connecting electrode, and the third though hole is located above the first drain electrode; and Step 4, depositing a transparent conductive film on the substrate after step 3, forming a pixel electrode and a third connecting electrode, wherein the pixel electrode is connected with the first drain electrode via the third through hole and the third connecting electrode is connected with the first connecting electrode and the second connecting electrode via the first through hole and the second through hole, respectively. |
