Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor

摘要

A magnetic field generator which provides greater control over the magnetic field is provided. The magnetic field generator has a plurality of overlapping main magnetic coil sections for forming a magnetic field generally parallel to the top surface of the supporting member. In other embodiments, sub-magnetic coil sections are placed symmetrically around the main magnetic coil sections.

主权项

1. A magnetic field generator for generating a magnetic field within a semiconductor substrate processing system, comprising:
a plurality of first coils that form a first magnetic field having a convex shape; and a plurality of second coils, positioned proximate to said plurality of first coils for providing a second magnetic field having a concave shape, where a combination of the first magnetic field and the second magnetic field form a magnetic field having a desired shape; wherein each coil of the plurality of first coils and the plurality of second coils have central axes that are radially aligned with and substantially perpendicular to a common central axis about which the plurality of first coils and the plurality of second coils are arranged, and wherein the central axis of any given coil of the plurality of first coils and the plurality of second coils is disposed at a 45 degree angle about the common central axis with respect to at least one other coil of the plurality of first coils and the plurality of second coils.