Multivariable solver for optical proximity correction

摘要

The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.

主权项

1. A computer-implemented method comprising:
determining, by the computer, a difference image value for a plurality of control points in a mask layout due to one or more perturbations applied to features in the mask layout associated with the control points; creating, by the computer, a multisolver matrix that includes the difference image values for all of the plurality of control points; simultaneously determining, by the computer, a correction delta value for each of the plurality of control points in the mask layout using the multisolver matrix.