| 摘要 |
PURPOSE:To provide a positive resist compsn. excellent in balance of various characteristics such as sensitivity, residual film rate and resolution, causing a small dimensional change to exposure especially in <=1mum fine working and giving an excellent pattern shape. CONSTITUTION:This positive resist compsn. contains alkali-soluble phenolic resin, a quinonediazidosulfonic ester type photosensitive agent and a hydroxy compd. represented by the formula, wherein each of R1-R4 is H, halogen, hydroxyl, 1-8C alkyl, 2-5C alkenyl, 1-4C alkoxy or phenyl substd. alkoxy. |
