发明名称 |
STRAIN MULTIPLE QUANTUM WELL SEMICONDUCTOR LASER |
摘要 |
PURPOSE:To provide a distortion multiple quantum well semiconductor laser which enables rapid operation without generating transfer inside an active layer. CONSTITUTION:The device is a distortion multiple quantum well semiconductor laser which is formed of an n-type In0.76Ga0.24As0.55P0.45 waveguide layer 102, a nondoped In0.7Ga0.3As/In0.76Ga0.24As0.55P0.45 distortion multiple quantum well active layer 103 and a p-type InP clad layer 104 on an n-type InP substrate 101. The distortion multiple quantum well active layer 103 consists of a ten-layer 3nm-thick In0.7Ga0.3As distortion well layer 114 and an In0.76Ga0.24As0.55P0.45 barrier layer. A barrier layer which is a fifth layer from the substrate 101 is a 30nm-thick distortion absorbing layer 115, and eight-layer barrier layer excepting it is 10nm-thick. According to this constitution, it is possible to readily acquire a semiconductor laser which is free from transfer into the active layer 103 and deterioration of injection efficiency of a hole and enables rapid operation.
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申请公布号 |
JPH0661570(A) |
申请公布日期 |
1994.03.04 |
申请号 |
JP19920207743 |
申请日期 |
1992.08.04 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KITO MASAHIRO;MATSUI YASUSHI |
分类号 |
H01S5/00;H01S5/042;H01S5/227;H01S5/34;H01S5/343;(IPC1-7):H01S3/18 |
主分类号 |
H01S5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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