| 摘要 |
<p>PURPOSE: A plasma reactor and a substrate treatment system including the same are provided to carry out more accurate edge treatment by a movable annular baffle member and an annular plasma generator. CONSTITUTION: A plasma reactor comprises a chamber housing(12), an annular baffle member(20), and an annular plasma generator. The chamber housing includes a substrate support in which a target substrate is placed. The annular baffle member is arranged in a first location in order to divide the space above the target substrate into inner and outer areas. The annular plasma generator generates annular plasma along the perimeter of the target substrate in the outer area during an edge treatment process.</p> |
