DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF

摘要

The present invention relates to a display device and a manufacturing method thereof, and more specifically, to reduce residual liquid crystal, the present invention includes a substrate including pixel regions, a thin film transistor located on the substrate, a first insulating layer located on the thin film transistor, a pixel electrode which is connected to the thin film transistor and is located on a first insulating layer, a common electrode which is located on the pixel electrode and is separated from the pixel electrode by a micro space, a second insulating layer located on the common electrode, a roof layer located on the second insulating layer, a common electrode to expose part of the micro space, an injection hole formed on the second insulating layer and the roof layer, a liquid crystal layer filled in the micro space, and a cover layer which is formed on the roof layer to cover the injection hole and seals the fine space. The thickness of the roof layer is about 4 μm to 50 μm.