| 摘要 |
The present invention is provided to maintain the distribution uniformity of plasma which is excited by microwaves. The microwave plasma processing apparatus of the present invention includes: a processing container which divides a processing space; a microwave generator which generates microwaves to make processing gas which comes into the processing space in plasma form; a distributor which distributes microwaves into multiple waveguides; an antenna which is installed in the processing container in order to seal the processing space and emits microwaves, which are distributed to the multiple waveguides by the distributor, to the processing space; a monitor unit which monitors the voltage of each of the multiple waveguides; and a control unit which obtains a control value of the distribution rate of the distributor, corresponding to a difference between a predetermined voltage and a monitor value of the voltage monitored by the monitor unit, from a memory unit memorizing by matching the difference with the control value, which corresponds to the difference, of the distribution rate of the distributor, and controls the distribution rate of the distributor based on the obtained control value. |
