发明名称 METHOD FOR DRYING RESIST
摘要 PURPOSE:To make a high-speed drying air flow to effectively act on a resist to be dried so as to effectively utilize infrared energy by providing air flow limiting plates closely to the surface of a substrate to be processed in a drying device and limiting the passage of the drying air flow to the vicinity of the substrate. CONSTITUTION:An infrared heating device 2 is provided in a drying device 1 and substrates 4 with applied resists 3 are continuously fed to the device 2. Air flow limiting plates 5 are provided closely to the substrates 4. Therefore, a drying air flow passes through the space between the plates 5 and substrates 4 and efficiently removes a solvent from the resist. In addition, when the plates 5 are formed of a heat resisting infrared-ray transmitting material, the resist can be effectively irradiated with radiation for heating.
申请公布号 JPH0684780(A) 申请公布日期 1994.03.25
申请号 JP19920231170 申请日期 1992.08.31
申请人 DAINIPPON PRINTING CO LTD 发明人 MIYASHITA HAJIME
分类号 B05D3/02;G03F7/16;G03F7/38;H01L21/027;(IPC1-7):H01L21/027 主分类号 B05D3/02
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