| 摘要 |
<p>The present invention relates to an apparatus for dressing a polishing pad and, more specifically, to an apparatus for dressing a polishing pad capable of evenly dressing the entire surface of the polishing pad by allowing a dressing tool to revolve and rotate. The apparatus for dressing a polishing pad for dressing polishing pads attached to each of upper and lower surface plates comprises: an arm inserted into the upper and lower surface plates to be horizontally moved; a guide provided on an end part of the arm to be rotated; a dressing tool which is provided to revolve around the guide and is in contact with the surfaces of the polishing pads to dress the polishing pads; and a driving force transferring means transferring rotating force of the guide to the dressing tool.</p> |
