VAPOR GROWTH DEVICE AND VAPOR GROWTH METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor growth device which reduces particles by preventing a reaction product of process gas and halogen-based gas from being generated.SOLUTION: The vapor growth device comprises: a reaction chamber for depositing a nitride; a first gas supply path for supplying halogen-based gas; a second gas supply path for supplying ammonia gas; a gas channel which is disposed in an upper part of the reaction changer and in which halogen-based gas is supplied from the first gas supply path to the reaction chamber; a shower plate for supplying gas into the reaction chamber while separating the gas channel supplying ammonia gas from the second gas supply path; and a support part which is provided at a lower side of the shower plate within the reaction chamber, and in which a substrate can be mounted.