发明名称 ACTIVE MATRIX SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To decrease the number of photoengraving processes in manufacturing an active matrix substrate.SOLUTION: A TFT substrate 200 includes: a pixel electrode 8 connected to a drain electrode 4 of a TFT 201; a source wiring 31 connected to a source electrode 3 of the TFT 201; and a gate wiring 71 connected to a gate electrode 7 of the TFT 201. The source electrode 3, the drain electrode 4 and the source wiring 31 include a conductive film in a same layer with the pixel electrode 8. A semiconductor layer in a same layer with a semiconductor film 2 constituting a channel part 2a of the TFT substrate 200 remains under the source wiring 31 and the pixel electrode 8.
申请公布号 JP2015012048(A) 申请公布日期 2015.01.19
申请号 JP20130134433 申请日期 2013.06.27
申请人 MITSUBISHI ELECTRIC CORP 发明人 ISHIGA NOBUAKI;INOUE KAZUNORI;TSUMURA NAOKI;NAGAYAMA KENSUKE;ITO YASUYOSHI
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
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