| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus for exposing a substrate by imaging a pattern on a mask on a substrate with a micro-lens array which miniaturizes an illumination unit emitting exposure light.SOLUTION: A micro-lens array 30 has a plurality of micro-lenses 31 arranged two-dimensionally including alignment in a direction intersecting a movement direction A, and an illumination unit 10 includes an LD array bar arranged with a plurality of laser diodes and an illumination optical system which causes, in the direction intersecting the movement direction A, a plurality of luminescent light beams emitted by the laser diodes constituting the LD array bar to spread over a plurality of micro-lenses 31 aligned in the movement direction A and converts, in the movement direction A, the luminescent light beams emitted by the laser diodes constituting the LD array bar into slit-shaped exposure light fluxes with a width restricted so as to be smaller than that of the micro-lenses 31 and irradiates the micro-lenses 31 aligned in a row with the exposure light consisting of an exposure flux. |
