| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a plating apparatus for conductive particles with a plating container undergoing rotation and revolution which allows electric conduction between a power source and an electrode without rotation sliding of an electric contact.SOLUTION: In a plating apparatus for conductive particles, a plating container which rotates about a first axial line A revolves around a second axial line B in parallel with the first axial line. The revolution orbit of the plating container forms an intersection space including the second axial line, and an anode and a cathode are arranged in the intersection space.</p> |
