| 摘要 |
PURPOSE:To provide a treating device which is constituted so that the concentration of a treating liquid can be maintained at a constant level and the treating accuracy and treating ability of the device can be improved. CONSTITUTION:A treating liquid supplying means 3 which supplies a new treating liquid is connected to a circulating system 2 which circulates and supplies the treating liquid L of semiconductor wafers W into a treating tank 1. Supplying flow rate control valves 14a, 14b, and 14c are provided on the treating liquid supplying side of the means 3 and the valves 14a, 14b, and 14c are continuously controlled in accordance with the concentration of the liquid L in the vessel 1. Therefore, the concentration of the liquid L in the vessel 1 can be always maintained at a constant level and the treating accuracy and treating ability of this treating device can be improved. |
