| 摘要 |
PURPOSE:To provide novel pattern forming materials each capable of forming a positive type resist with high contrast and high sensitivity. CONSTITUTION:The objective 1st pattern forming material contains a compd. having 1-5 isopropenyloxycarbonyl groups and 150-1,000 mol.wt. and insoluble in an alkaline aq. soln., an alkali-soluble polymer and an optical acid generating agent as principal components. The objective 2nd pattern forming material cotnains a polymer having a side chain contg. isopropenyloxycarbonyl groups and insoluble in an alkaline aq. soln. and an optical acid generating agent as principal components. |
