发明名称 FILM FORMATION METHOD, AND FILM FORMATION DEVICE USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To improve a film quality, since the film quality is deteriorated by radiation heat emitted from a film formation material supplier.SOLUTION: In a film formation method for forming a film on a substrate by supplying a film formation material from a film formation material supplier onto the substrate in the state where the substrate is mounted on a pedestal, a film quality can be improved by providing a shield plate having an opening part for allowing the film formation material to pass therethrough between the substrate and the film formation material supplier.</p>
申请公布号 JP2015010254(A) 申请公布日期 2015.01.19
申请号 JP20130135825 申请日期 2013.06.28
申请人 PANASONIC HEALTHCARE CO LTD 发明人 HATAYAMA TAKESHI;KINO MASAHIRO
分类号 C23C14/24;H01L21/363 主分类号 C23C14/24
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