发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING PHOTOSPACER AND COLOR FILTER
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer that allows formation while enabling both smaller diameter of a PS concurrent with higher definition of a color filter 1 and higher sensitivity, and a color filter 1 using the photospacer.SOLUTION: A photosensitive resin composition for forming a photospacer 5 includes photoinitiator, binder polymer, photosensitive monomer, surfactant and solvent. The photosensitive resin composition for forming a photospacer 5 is laminated on a light shielding layer 3 on a transparent substrate 2, as a photospacer 5 included in a color filter 5 for a liquid crystal display device. The photoinitiator includes a fluorene-based oxime ester compound expressed by chemical formula 1.
申请公布号 JP2015011095(A) 申请公布日期 2015.01.19
申请号 JP20130134690 申请日期 2013.06.27
申请人 TOPPAN PRINTING CO LTD 发明人 IKAME TADAATSU;ASAHI NORIKO
分类号 G02B5/20;G02F1/1339;G03F7/004;G03F7/031 主分类号 G02B5/20
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