METHOD OF MANUFACTURING SUBSTRATE FOR ELECTRO-OPTIC DEVICE, SUBSTRATE FOR ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate for an electro-optic device, which is capable of effectively utilizing incident light, the substrate for electro-optic device, and the electro-optic device and an electronic apparatus which use the substrate for electro-optic device.SOLUTION: The method of manufacturing a substrate for an electro-optic device includes: a step (step S1) of forming a groove part on a first surface of a light-transmissive substrate; a step (step S2) of forming a sacrificial film filling the groove part; a step (step S4) of forming a light-transmissive mask layer having a hole reaching the sacrificial film in the groove part; a first etching step (step S5) of etching away the sacrificial film in the groove part through the hole of the mask layer; steps (steps S6 and S8) of forming a light-transmissive cap layer closing the hole; and a second etching step (step S10) of forming a projection including the cap layer in a hole-closing part by etching the cap layer except the hole-closing part while leaving the cap layer in the hole-closing part.