发明名称 METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK HAVING METAL FRAME, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask having a metal frame, in which a vapor deposition mask capable of being highly defined and weight-saved even when increased in size and a metal frame are precisely fixed.SOLUTION: A vapor deposition mask 100 is configured by laminating: a metallic mask 10 having a plurality of slits 15 formed therethrough; and a resin mask 20 positioned on a surface of the metallic mask 10 and having openings 25 formed to correspond to a pattern to be formed by a vapor deposition. There is a fixing step of fixing the vapor deposition mask, in which the metallic mask 10 formed with the slits 15 and the resin mask 20 formed with the openings 25 corresponding to the pattern to be vapor-deposited at a position to overlap the slits are laminated, to the metal frame formed with through holes.
申请公布号 JP2015010263(A) 申请公布日期 2015.01.19
申请号 JP20130136822 申请日期 2013.06.28
申请人 DAINIPPON PRINTING CO LTD 发明人 OBATA KATSUYA;OKAMOTO EISUKE
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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