| 摘要 |
本发明系提供一种化学机械研磨垫，包括：具有研磨表面之研磨层；以及具有沿着与该研磨表面之平面垂直之轴之厚度的宽谱终点侦测窗块；其中该宽谱终点侦测窗块包括环状烯烃加成聚合物；其中该宽谱终点侦测窗块跨其厚度具有均一之化学组成；其中该宽谱终点侦测窗块具有40%之光谱损失；以及其中该研磨表面系适用于研磨选自磁性基板，光学基板及半导体基板之基板。; and, a broad spectrum, endpoint detection window block having a thickness along an axis perpendicular to a plane of the polishing surface; wherein the broad spectrum, endpoint detection window block, comprises a cyclic olefin addition polymer; wherein the broad spectrum, endpoint detection window block exhibits a uniform chemical composition across its thickness; wherein the broad spectrum, endpoint detection window block exhibits a spectrum loss < 40%; and, wherein the polishing surface is adapted for polishing a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate. |
