发明名称 SLURRY COMPOSITION
摘要 <p>In the present invention, provided is a slurry composition. According to the present invention, the slurry composition comprises polishing particles; a negative ion polymer dispersing agent with a carboxyl group; and an inhibitor for polishing oxide films wherein the inhibitor for polishing oxide films comprises dopamine and a dopamine group. In the present invention, the polishing particle includes at least one selected from a group consisting of metal oxides and organic materials or the metal oxide in colloidal state. In the configuration of the present invention, the slurry composition of the present invention is allowed to control the speed of polishing the oxide film according to the additive amount of the dopamine.</p>
申请公布号 KR101483451(B1) 申请公布日期 2015.01.16
申请号 KR20130126446 申请日期 2013.10.23
申请人 K.C.TECH CO., LTD. 发明人 HAN, MOUNG HUN;KIM, SUN KYOUNG;HWANG, JIN MYUNG;LEE, JAE WOO;GWON, CHANG GIL
分类号 C09K3/14;H01L21/304 主分类号 C09K3/14
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