| 摘要 |
PURPOSE:To improve the unsatisfactory sensitivity, chemical resistance (at the time of etching or planographic printing) and mechanical strength of a conventional photo-cationic polymerizable compsn. as the defects of the compsn. when used as the material of the photosensitive layer of a photosensitive planographic printing plate, a photoresist, etc., and to obtain a photosensitive compsn. having high sensitivity and excellent in chemical resistance and mechanical strength. CONSTITUTION:This photosensitive compsn. contains microgel dispersible in an org. solvent, a compd. having a vinyl ether group or a propenyl ether group and an optical acid generating agent or contains microgel having at least one of a vinyl ether group and a propenyl ether group and at least one ring selected from among oxirane, thiirane, oxetane and thietane. |
