| 发明名称 |
PATTERNED THIN FILMS BY THERMALLY INDUCED MASS DISPLACEMENT |
| 摘要 |
The described invention provides a method of patterning a thin film deposited on a substrate comprising applying a moving focused field of thermal energy to the thin film deposited on the substrate; and dewetting the thin film from the substrate. Dewetting the thin film from the substrate is characterized by a negative space of a desired design; and displacement of the thin film into adjacent structures, thereby accumulating thin film in the adjacent structures. |
| 申请公布号 |
US2015014891(A1) |
申请公布日期 |
2015.01.15 |
| 申请号 |
US201414202972 |
申请日期 |
2014.03.10 |
| 申请人 |
Amatucci Glenn G.;Ferrer Anthony |
发明人 |
Amatucci Glenn G.;Ferrer Anthony |
| 分类号 |
B23K26/00;B23K26/08 |
主分类号 |
B23K26/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of patterning a thin film deposited on a substrate comprising:
(A) applying a moving focused field of thermal energy to the thin film deposited on the substrate; and (B) dewetting the thin film from the substrate, the dewetting being characterized by:
(i) a negative space of a desired design; and(ii) displacement of the thin film into adjacent structures, thereby accumulating thin film in the adjacent structures. |
| 地址 |
Peapack NJ US |
