发明名称 Semiconductor device
摘要 An object is to provide a display device with a high aperture ratio or a semiconductor device in which the area of an element is large. A channel formation region of a TFT with a multi-gate structure is provided under a wiring that is provided between adjacent pixel electrodes (or electrodes of an element). In addition, a channel width direction of each of a plurality of channel formation regions is parallel to a longitudinal direction of the pixel electrode. In addition, when a channel width is longer than a channel length, the area of the channel formation region can be increased.
申请公布号 KR101482920(B1) 申请公布日期 2015.01.15
申请号 KR20070072546 申请日期 2007.07.20
申请人 发明人
分类号 H01L29/786;H05B33/02 主分类号 H01L29/786
代理机构 代理人
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