BUBBLING SUPPLY SYSTEM FOR STABLE PRECURSOR SUPPLY

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for evaporating a liquid precursor used for a material deposition process, in a semiconductor process.SOLUTION: A bubbling system 500 for supplying a vapor of a liquid precursor has: a gas flow conduit 508 having a first end 504 and a second end 503; a nozzle structure 501 connected to the second end of the gas flow conduit, and having one or more perforated conduits 502 fluidly coupled with the second end of the gas flow conduit; and a plate 506 disposed around the gas flow conduit and in a spaced relationship from the nozzle structure, and immersed in the liquid precursor. Both of one or more perforated conduits and the plate extend radially from an axis of the gas flow conduit.