| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device which reduces removal unevenness of dust and inhibits the dust from scattering in a surrounding area when cleaning an inner wall of a semiconductor device.SOLUTION: A cleaning device includes: a cylindrical body 10; a holding member 20 which is provided at one end of the cylindrical body and holds the cylindrical body; a contact member 30 which is formed into a spiral shape on an outer peripheral surface of the cylindrical body and contacts with an inner wall of a semiconductor device; and a support member 40 where one end has an opening part 41 that opens at a position near the contact member and the other end may be connected with suction means 50 that suctions dust from the opening part, the support member 40 supporting the cylindrical body and the holding member so that the cylindrical body and the holding member move forward and backward in the semiconductor device. |
