| 摘要 |
In an imaging apparatus (1), the optical axis of an imaging unit (6) and the illumination positions illuminated by light sources (5) are adjusted by forming a slope (12) on one surface side of a pedestal (3) and fixing, along the slope (12) of the pedestal (3), a flexible substrate (4) on which the light sources (5) are disposed. Thus, the adjustment of the illumination positions is facilitated by adjusting the optical axes of the light sources (5) all at once by shaping the substrate (4) along the slope (12) of the pedestal (3), and not by adjusting the optical axis of each of the light sources (5) individually. Furthermore, because the heat generated at the light sources (5) is radiated through the pedestal (3), the light sources (5) dissipate heat exceptionally well. The output stability of the light sources (5) is thereby excellently maintained. |
