Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member

摘要

A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps; a) cutting the surface of the substrate to remove the surface in the desired thickness; and b) bringing the cut surface of the substrate into contact with water having a temperature of from 5 DEG C. to 90 DEG C., having a resistivity of not less than 11 M OMEGA xcm at 25 DEG C., containing fine particles with a particle diameter of not smaller than 0.2 mu m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kgxf/cm2 to 300 kgxf/cm2.