发明名称 METHOD FOR PRODUCING MATT COPPER DEPOSITS
摘要 The present invention relates to a method for deposition of a matte copper coating wherein a first copper layer is deposited from an aqueous copper electrolyte which does not contain an organic compound comprising divalent sulfur. A second copper layer is then deposited onto the first copper layer from an aqueous copper electrolyte comprising a first and a second water soluble sulfur-containing additive wherein the first water soluble sulfur-containing compound is an alkyl sulfonic acid derivative and the second water soluble sulfur-containing additive is an aromatic sulfonic acid derivative. The method provides copper layers with a homogeneous and adjustable matte appearance for decorative applications.
申请公布号 US2015014177(A1) 申请公布日期 2015.01.15
申请号 US201214374000 申请日期 2012.11.27
申请人 Atotech Deutschland GmbH 发明人 Kretschmer Stefan;Hartmann Philip;Roelfs Bernd
分类号 C25D3/38;C25D5/10 主分类号 C25D3/38
代理机构 代理人
主权项 1. A method for deposition of a matte copper coating comprising, in this order, the steps a. providing a substrate, b. depositing a first copper layer onto the substrate from a first aqueous electrolyte comprising a source of copper ions, at least one acid and at least one polyether compound wherein said first electrolyte does not contain an organic compound comprising divalent sulfur and c. depositing a second copper layer onto the first copper layer from a second aqueous electrolyte comprising a source of copper ions, at least one acid, a first water soluble sulfur-containing additive selected from the group consisting of alkyl sulfonic acid derivatives and a second water soluble sulfur containing additive selected from the group consisting of aromatic sulfonic acid derivativeswherein a current density is applied to the substrate during steps b and c.
地址 Berlin DE