| 摘要 |
<p> Provided are: a semi-transparent Ag alloy film having excellent smoothness, heat-resistance and resistance to sulfurization, as well as satisfactory conductivity and permeability; and a sputtering target for forming a transparent Ag alloy film, suited to the formation of this transparent Ag alloy film. The transparent Ag alloy film is characterized in that the total content of In and/or Sn is 0.1at% to 1.5at%, the content of Sb exceeds 0.010at% but does not exceed 2.0at%, with the remainder being made up of Ag and unavoidable impurities, the film thickness does not exceed 20nm, and transmissivity at a wavelength of 550nm is at least 30%.</p> |
