| 发明名称 |
MAGNETIC FIELD GENERATION APPARATUS AND SPUTTERING APPARATUS |
| 摘要 |
Provided is a magnetic field generation apparatus including: two or more main magnetic pole portions configured to generate a main magnetic field; one or more secondary magnetic pole portions including a plurality of first divisional magnets obtained by a division, that generate a secondary magnetic field for adjusting the generated main magnetic field; and a yoke portion including one or more first yokes opposing the plurality of first divisional magnets in correspondence with the one or more secondary magnetic pole portions. |
| 申请公布号 |
US2015014158(A1) |
申请公布日期 |
2015.01.15 |
| 申请号 |
US201414319638 |
申请日期 |
2014.06.30 |
| 申请人 |
Sony Corporation |
发明人 |
Sasaki Jun;Abe Atsuhiro;Hiratsuka Ryoichi |
| 分类号 |
H01J37/34;H01F7/02 |
主分类号 |
H01J37/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A magnetic field generation apparatus, comprising:
two or more main magnetic pole portions configured to generate a main magnetic field; one or more secondary magnetic pole portions including a plurality of first divisional magnets obtained by a division, that generate a secondary magnetic field for adjusting the generated main magnetic field; and a yoke portion including one or more first yokes opposing the plurality of first divisional magnets in correspondence with the one or more secondary magnetic pole portions. |
| 地址 |
Tokyo JP |
