| 发明名称 |
PHOTOLITHOGRAPHIC PATTERNING OF A CYLINDER |
| 摘要 |
Methods herein form a photoresist on an exterior of a cylinder and expose the photoresist to a light source while rotating the cylinder. Such methods develop the photoresist, after exposing, to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, these methods pattern the exterior of the cylinder while rotating the cylinder using the patterned protective layer to produce a patterned cylinder. |
| 申请公布号 |
US2015017588(A1) |
申请公布日期 |
2015.01.15 |
| 申请号 |
US201313940315 |
申请日期 |
2013.07.12 |
| 申请人 |
Xerox Corporation |
发明人 |
Kurz Karl E.;Prizant Amir;Blair Christopher D. |
| 分类号 |
G03F7/00;C23F1/00;B44C1/22 |
主分类号 |
G03F7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
forming a photoresist on an exterior of a cylinder of material; exposing said photoresist to a light source while rotating said cylinder; developing said photoresist after said exposing to change said photoresist into a patterned protective layer on said exterior of said cylinder; and patterning said exterior of said cylinder using said patterned protective layer to produce a patterned cylinder. |
| 地址 |
Norwalk CT US |
