发明名称 |
SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device including a transistor and a connection portion is provided. The transistor includes a gate electrode, a first insulating film over the gate electrode, an oxide semiconductor film over the first insulating film and at a position overlapping with the gate electrode, and source and drain electrodes electrically connected to the oxide semiconductor film; and the connection portion includes a first wiring on the same surface as a surface on which the gate electrode is formed, a second wiring on the same surface as a surface on which the source and drain electrodes are formed, and a third wiring connecting the first wiring and the second wiring. The distance between an upper end portion and a lower end portion of the second wiring is longer than the distance between an upper end portion and a lower end portion of each of the source and drain electrodes. |
申请公布号 |
US2015014680(A1) |
申请公布日期 |
2015.01.15 |
申请号 |
US201414323341 |
申请日期 |
2014.07.03 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
YAMAZAKI Shunpei;MIYAKE Hiroyuki;SATO Takahiro;JINTYOU Masami |
分类号 |
H01L27/12 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a first wiring; a second wiring; a third wiring electrically connecting the first wiring and the second wiring; and a transistor comprising:
a semiconductor film including a channel formation region; anda source electrode and a drain electrode electrically connected to the semiconductor film, wherein the second wiring, the source electrode and the drain electrode are provided on a same surface, wherein each end portion of the second wiring, the source electrode and the drain electrode comprises an upper end portion and a lower end portion, and wherein a distance between the upper end portion and the lower end portion of the second wiring is longer than a distance between the upper end portion and the lower end portion of each of the source electrode and the drain electrode. |
地址 |
Atsugi-shi JP |