| 摘要 |
Provided is a polishing composition which enables the improvement in a polishing rate while rarely affecting the quality of a surface. Provided is a polishing composition comprising abrasive grains, water and a quaternary ammonium cation represented by general formula (A). [In the formula, R1, R2, R3 and R4 may be the same as or different from one another and independently represent an organic group, wherein at least one of R1, R2, R3 and R4 represents an organic group having 3 or more carbon atoms.] |
