DROP PATTERN GENERATION FOR IMPRINT LITHOGRAPHY WITH DIRECTIONALLY-PATTERNED TEMPLATES
摘要
Imprint lithography methods that incorporate depositing droplets of polymerizable material in patterns that improve fill time performance when employing directionally-oriented imprint templates. The patterns are based on grid arrays formed of repeating sets of rows of droplets oriented along fast and slow axes, with droplets of each row offset along the slow axis relative to droplets in adjacent rows.
申请公布号
WO2015006695(A1)
申请公布日期
2015.01.15
申请号
WO2014US46357
申请日期
2014.07.11
申请人
CANON NANOTECHNOLOGIES, INC.;TOSHIBA CORPORATION
发明人
FLETCHER, EDWARD BRIAN;SCHMID, GERARD M.;IM, SE-HYUK;KHUSNATDINOV, NIYAZ;SRINIVASAN, YESHWANTH;LIU, WEIJUN;XU, FRANK Y.