| 摘要 |
PROBLEM TO BE SOLVED: To provide a backing plate with sufficient size and mechanical strength capable of processing a large-area substrate in a plasma chemical vapor phase deposition (PECVD) processing chamber.SOLUTION: In a PECVD device, a chamber 100 generally includes a wall part 102 defining a processing volume 106, a bottom part 104, a shower head 110, and a substrate support 130. The shower head 110 is coupled to the backing plate 112 at its peripheral edge by a suspension 114. Also, the shower head 110 is coupled to the backing plate 112 by one or more coupling supports 160, for preventing the shower head 110 from sinking, and/or controlling straightness/curvature. The coupling support 160 can include a fastening mechanism such as a nut/bolt assembly. |
