发明名称 |
SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD, AND STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a technology capable of suppressing drops from being remained after cleaning processing and reducing residue when a surface of a substrate is cleaned with cleaning liquid while rotating the substrate.SOLUTION: By using a cleaning liquid nozzle 41 and a nitrogen gas nozzle 51, cleaning liquid and nitrogen gas are sequentially discharged to a center part of a wafer W while rotating the wafer W, and both nozzles are moved to a peripheral edge part side of the wafer W. Then, the discharge of the cleaning liquid is switched to a second cleaning liquid nozzle 43 that is set at a position deviated from a moving track of the first cleaning liquid nozzle 41. Both nozzles are moved to the peripheral edge side of the wafer W while performing the discharge of the cleaning liquid and the discharge of the gas, and each nozzle moves so as to gradually reduce a difference between a distance from the discharge position of the second cleaning liquid nozzle 43 to the center part of the wafer W and a distance from the discharge position of the second nitrogen gas nozzle 53 to the center part of the wafer W. |
申请公布号 |
JP2015008267(A) |
申请公布日期 |
2015.01.15 |
申请号 |
JP20140014864 |
申请日期 |
2014.01.29 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
OKOCHI ATSUSHI;YOSHIHARA KOSUKE;ICHINOMIYA HIROSHI;NISHIHATA HIROSHI |
分类号 |
H01L21/304;G03F7/30;H01L21/027 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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