发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress variation in load applied to a semiconductor wafer when the semiconductor wafer is ground.SOLUTION: A method of manufacturing a semiconductor device includes the following steps of: preparing a semiconductor wafer 10 divided into a plurality of first semiconductor chips 12; providing at least one stage of second semiconductor chips 22 in some semiconductor chips among the plurality of first semiconductor chips 12; providing an encapsulating material 32 on the first semiconductor chip 13 where second semiconductor chips 22 are not provided; and grinding one surface opposite from the surface on which the second semiconductor chip 22 and the encapsulating material 32 are provided, of the semiconductor wafer 10.
申请公布号 JP2015008210(A) 申请公布日期 2015.01.15
申请号 JP20130132704 申请日期 2013.06.25
申请人 MICRON TECHNOLOGY INC 发明人 KOYANAGI TADASHI;ITO HIROYUKI
分类号 H01L25/07;H01L21/56 主分类号 H01L25/07
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