Disclosed is a substrate cleaning apparatus, comprising: a housing which is provided with a cleaning chamber therein; multiple spray pipelines (2) which are pivotally mounted in the housing and are distributed in parallel along the moving direction of a substrate (1), each spray pipeline (2) being provided with several spray ports (21) for guiding liquid in the spray pipelines (2) to a cleaned surface of the substrate (1), and one end of each spray pipeline (2) being provided with a transmission gear (3) coaxially fixed thereto; a driving system (4) which is connected to the transmission gear (3) and drives by means of the transmission gear (3) the spray pipelines (2) to rotate reciprocally at the same frequency, wherein the direction of the reciprocating rotation of some of the spray pipelines (2) is opposite to that of other spray pipelines (2). The substrate cleaning apparatus can guarantee an improved cleaning effect for the substrate surface under the premise of having little effect on the substrate moving speed.
申请公布号
WO2015003433(A1)
申请公布日期
2015.01.15
申请号
WO2013CN85214
申请日期
2013.10.15
申请人
HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.;BOE TECHNOLOGY GROUP CO., LTD.