LASER LIGHT SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To achieve shorter processing time at a time of processing a substrate using a laser beam.SOLUTION: This substrate processing apparatus is an apparatus processing a substrate by irradiating the substrate with a laser beam, and comprises: a workpiece table 2 on which a processing target substrate is mounted; a laser beam output unit 15 outputting the laser beam; a galvano scanner 19 and a lens unit 20; an optical system 16; and a table moving mechanism 5. The galvano scanner 19 and the lens unit 20 condense the input laser beam onto a plurality of points linearly different in a depth position of the substrate in a predetermined range and repeatedly perform scanning in the predetermined range. The optical system 16 guides the laser beam from the laser beam output unit 15 to the galvano scanner 19.