| 摘要 |
A mask for exposure is supported at three positions on a holding surface of a mask chuck of an X-ray exposure apparatus by means of kinematic mounting. Magnetic units, each comprising an electromagnet, and magnetic rings are provided around supporting points at the three,positions on the mask chuck and on the mask frame, respectively. It is thereby possible to generate a tensile force to magnetically attract the mask frame in the direction of the normal of the holding surface of the mask chuck, and to attract and hold the mask on the mask chuck. Thus, the mask can be chucked on the X-ray exposure apparatus in substantially the same state as that of a mechanical clamp on an electron beam (EB) scanning apparatus while the mask is manufactured, without using a mechanical clamping mechanism.
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