| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a sample stage for an electron beam lithography equipment capable of directly holding a mask blank of various sizes different in plane dimensions and thicknesses. SOLUTION: A sample stage for an electron beam lithography equipment includes a stage board 1, three clamp members 3b to 3c with their circumferential edge for holding a blank mask 20, sliding stages 5a and 5b, and a supporting plate 6. In this case, each clamp member is made up of a reference member 31 with a reference face to the stage board 1, a base member 32 for supporting the reference member 31, and a supporting pin 33 fitted to the base member 32. The clamp member 3b supported by the sliding stage 5a is provided along one side of the blank mask 20, while the clamp member 3c supported by the sliding stage 5b is provided along the opposite side of the blank mask 20. These members 3b and 3c are movable in parallel to the stage board 1. The supporting plate 6 is provided under the sliding stages 5a and 5b to drive each supporting pin 33 in a vertical direction.</p> |
