发明名称 ROTARY TYPE SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent a treating liquid from being adhered and deposited on the surface on the side of the slant surface of a downpart by a method wherein the surface on the side of the slant surface of the downpart, which is formed extending over the whole periphery in the vicinity of the upper end part of the slant surfaced of a scattering prevention cup, is folded back in the direction in which the downpart is separated from the center of rotation of a substrate. SOLUTION: A scattering prevention cup 3 for preventing a treating liquid or the like from being scattered is arranged on the periphery of a spin-chuck. This cup 3 is constituted of an upper cup 31, a circular rectifying plate 32, a lower cup 33 and the like. This cup 31 has an open part 41 for taking up a downflow air flow, which is made to flow through the whole rotary type substrate treating device, a slant surface 42, which gives a splash of a photoresist liquid or the like due to the rotation of a substrate W to the lower direction, and the like. Moreover, a downpart 43 is formed extending over the whole periphery in the vicinity of the upper end part of the slant surface 42 of the cup 31. The whole of this downpart 43 (the surface 44 on the side of the slant surface 42 of the downpart 43) is folded back in the direction in which the part 43 is separated from the center of rotation of the substrate W.
申请公布号 JPH09260266(A) 申请公布日期 1997.10.03
申请号 JP19960090582 申请日期 1996.03.18
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KAWAMOTO TAKANORI;FUJITA MITSUHIRO
分类号 G03F7/16;B05C11/08;G03F7/30;H01L21/00;H01L21/027;H01L21/304;(IPC1-7):H01L21/027 主分类号 G03F7/16
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