| 摘要 |
PROBLEM TO BE SOLVED: To improve overlay precision of exposure patterns, by correcting system error in a shot which depends on a wafer stage position in an optical system demagnification pojecting aligner. SOLUTION: In this aligner, a circuit pattern drawn on a reticle 6 mounted on a reticle stage 10a is projected on a semiconductor wafer 4 mounted on a wafer stage 5a, and shots are formed. At this time, the rotation errorθfor each shot which is formed on the wafer 4 is detected, and is approximated by a functionθs (x, y) of n-degree, in the wafer surface coordinates (x, y). Control is so performed that the rotation position in a stage surface of at least one out of the reticle stage 10a and the wafer stage 5a is set in accordance with the functionθs (x, y).
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