| 摘要 |
<p>The present invention relates to a burner and, more specifically, to a waste gas burner to burn and process waste gas discharged after being used in a process such as a semiconductor manufacturing process. The waste gas burner according to the present invention includes: a waste gas guide chamber which includes a wall forming a space in which waste gas flows and has an open end so that the waste gas can be discharged; a waste gas manifold which is connected to the waste gas guide chamber in order to supply waste gas; an internal guide which includes a first guide wall surrounding the waste gas guide chamber; an external guide which surrounds the first guide wall with an interval from the first guide wall and includes a second guide wall forming a combustible gas flow space in which combustible gas flows with the first guide wall; an insulating member which electrically insulates the internal guide from the external guide by being arranged between the internal guide and the external guide; and at least one gas inlet pipe which is connected with the combustible gas flow space in order to supply combustible gas to the combustible gas flow space. The present invention is formed to apply a high voltage in the first guide wall or the second guide wall so that combustible gas is ignited in the downstream of the combustible gas flow space by generating a spark between the first guide wall and the second guide wall.</p> |
